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P&P Scholarship Winner Interview: Ashely Peifer

november 24, 2016

Ashely Peifer final logo style guide

We recently launched the 2017 Make it in Design Scholarship in association with Print & Pattern. Last year we were thrilled to receive some amazing entries from applicants in 27 different countries around the world and had a wonderful time reviewing all of the applications.

Entries are shortlisted by ABSPD co-founders Rachael Taylor and Beth Kempton, with final judging by Marie Perkins at the Print & Pattern blog.

The lucky winners of the 2016 scholarship each received a free place on Modules 1-3 of The Art & Business of Surface Design and The Ultimate Portfolio Builder

Plus 90 days free access to leading trend forecasting site WGSN and opportunities to feature on the Print & Pattern blogMOYO magazine, and the Make it in Design website.

In the run up to the 2017 scholarship we wanted to showcase our very talented scholarship winners from 2016 and so today we bring you an interview with Ashely Peifer who was selected by Marie Perkins of the Print & Pattern blog.

Ashely Peifer is a Minneapolis-based artist and textile designer. Influenced by her time in the studio, Ashely creates sunny patterns that are filled with hand-painted motifs. She is inspired by optimism, Mary Oliver, collecting art, and playing.

Ashely’s patterns can be found at Maria Stanley, Anthropologie, Lord & Taylor, and Revolve Clothing. Her work has been featured on the Urban Outfitters blog, Uppercase Magazine (forthcoming), Print & Pattern, Make it in Design, Design*Sponge, New American Paintings, and more.


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Images: Lindsey Wixson for Maria Stanley (AW 16), photographed by Michael J. Spear 

  • When did your interest in design first start and how did that come about?

I was approached by LA-based designer Maria Stanley to create a pattern for her Fall 2016 collection based on my paintings and I dove in headfirst. I have an undergrad degree in graphic design, so I was already familiar with the Adobe creative suite and that definitely helped my transition into pattern design.

Thanks to Maria, my patterns have been worn by Lindsey Wixson and Julia Stiles among others, and are for sale in Anthropologie, Lord & Taylor, and Revolve Clothing.

 

  • What steps did you take to get to where you are now as a designer?

It started with a lot of online research, Elizabeth Olwen’s Skillshare class, and receiving the scholarship from MIID (which has been the hugest help of all). I have an MFA in painting and maintain a studio practice, so I am interested in the intersection between my paintings and patterns.

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  • How would you describe your style?

Painterly, playful, and optimistic.

 

  • What kind of designer do you want to be known as?

I am interested in designing for apparel and home goods, but I don’t want to box myself in quite yet.

 

  • What are you working on currently?

For my studio practice, I am working with a curator in Switzerland on a solo show in May 2017. For my patterns, I am gearing up for a possible Surtex show in 2018.

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  • What advice would you give emerging designers wanting to build their portfolios?

Work hard to develop your own style and apply to tons of opportunities.

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Image: Zarina Nairs for Maria Stanley (SS 17), photographed by Michael J. Spear

  • What would be your dream design gig?

Designing a collection for Land of Nod is a huge dream. I have a two year old daughter, so creating with children in mind would be so much fun.

 

  • Looking ahead what are your major goals for the next couple of years?

The usual goals like building up my portfolio, finding an agent, and attending Surtex… but I’m also really interested in finding ways to further blur the lines between my studio practice and textile designs. I’m starting to experiment with fiber arts as an answer to this.

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Image: Print All Over Me fellowship pieces, photographed by Jennifer Meneghin

  • If you were a pattern what kind of a pattern would you be and why?

A colorful, abstract print because that’s what comes naturally to me when I work.

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Images: Print All Over Me fellowship pieces, photographed by Jennifer Meneghin

  • How did you find out about the P&P scholarship?

I was googling ways to learn about pattern design and MID popped up. I was so intrigued! I’m glad I applied because this experience has been incredible and so informative.

 

  • Please tell us about your experience of the e-courses taken as a result of winning the scholarship.

Setting aside time every day to learn about pattern design and the business behind it has helped my work grow so much. I’m juggling a lot right now, yet the lessons each day were doable while still being informative and challenging.

 

  • What advice would you give to designers thinking of applying for this years scholarship?

Go for it! Let your unique voice shine through your patterns.

 

  • What was the most important lesson you took away from the e-course?

I’m having a hard time choosing one thing but Module 3 has been the most helpful so far. It’s so hard to find detailed information about the business side of pattern design and this module was the answer to that.

 

  • What difference did it make to have a supportive community of fellow students and how important do you think that will be going forward?

I enjoyed seeing all of the posts in the Facebook groups. It encouraged me to get to work on my own designs for sure. It is so important to have a group of people who to share knowledge with and to bounce ideas off of.


Ashely PeiferAshely Peifer is a Minneapolis-based artist and textile designer. Influenced by her time in the studio, Ashely creates sunny patterns that are filled with hand-painted motifs. She is inspired by optimism, Mary Oliver, collecting art, and playing.

Ashely’s patterns can be found at Maria Stanley, Anthropologie, Lord & Taylor, and Revolve Clothing. Her work has been featured on the Urban Outfitters blog, Uppercase Magazine (forthcoming), Print & Pattern, Make it in Design, Design*Sponge, New American Paintings, and more.

Website | Twitter | Instagram


MIID_P&PSCHOLARSHIP_2017_550X300PX_LR

WANT TO ENTER? – CLOSING DATE FOR SUBMISSIONS DECEMBER 31st 2016!

CLICK HERE FOR THE FULL DETAILS


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